共 8 条
- [2] ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 883 - 893
- [3] MEASUREMENT AND MODELING OF ION ENERGY-DISTRIBUTION FUNCTIONS IN A LOW-PRESSURE ARGON PLASMA DIFFUSING FROM A 13.56 MHZ HELICON SOURCE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (02): : 398 - 403
- [4] MODELING OF PLASMA-FLOW DOWNSTREAM OF AN ELECTRON-CYCLOTRON RESONANCE PLASMA SOURCE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 2913 - 2918
- [5] INFLUENCE OF A DIRECT-CURRENT BIAS ON THE ENERGY OF IONS FROM AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (03): : 434 - 438
- [6] SHAMPINE LF, 1975, COMPUTER SIMULATIONS
- [8] 1989, ECR SOURCE OPERATION