MOTION OF IONS IN AN ELECTRON-CYCLOTRON-RESONANCE PLASMA

被引:3
作者
KOHLER, WE
ROMHELD, M
SEEBOCK, RJ
机构
[1] SIEMENS RES LABS,PLASMA & SWITCHING TECHNOL,POB 3220,D-91050 ERLANGEN,GERMANY
[2] UNIV ERLANGEN NUMBERG,INST TECH PHYS,D-91058 ERLANGEN,GERMANY
关键词
D O I
10.1063/1.110316
中图分类号
O59 [应用物理学];
学科分类号
摘要
The motion of ions emerging from an electron-cyclotron-resonance plasma source has been investigated. Trajectories have been calculated by solving the ion equations of motion in a divergent magnetic field and an electrostatic longitudinal accelerating field which has to be evaluated self-consistently. The trajectory calculations have been combined with a Monte Carlo procedure for choosing the initial ion phase space variables in order to study the propagation of the ion distribution function. It is shown that outside the chamber the spatial profile of this distribution is increasingly broadened with distance from the second magnet due to the diverging magnetic field lines, while at the same time the ions gain energy from the electrostatic field. For an argon plasma a mean ion beam energy of about 16 eV with respect to the plasma source potential results at the target plane in a distance of 60 cm from the source.
引用
收藏
页码:2890 / 2892
页数:3
相关论文
共 8 条
  • [1] THE ELECTROSTATIC POTENTIALS IN AN ELECTRON-CYCLOTRON-RESONANCE PROCESSING PLASMA
    ASHTIANI, KA
    SHOHET, JL
    ANDERSON, FSB
    ANDERSON, DT
    FRIEDMANN, JB
    [J]. PLASMA CHEMISTRY AND PLASMA PROCESSING, 1992, 12 (02) : 161 - 175
  • [2] ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION
    ASMUSSEN, J
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 883 - 893
  • [3] MEASUREMENT AND MODELING OF ION ENERGY-DISTRIBUTION FUNCTIONS IN A LOW-PRESSURE ARGON PLASMA DIFFUSING FROM A 13.56 MHZ HELICON SOURCE
    CHARLES, C
    BOSWELL, RW
    PORTEOUS, RK
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (02): : 398 - 403
  • [4] MODELING OF PLASMA-FLOW DOWNSTREAM OF AN ELECTRON-CYCLOTRON RESONANCE PLASMA SOURCE
    HUSSEIN, MA
    EMMERT, GA
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 2913 - 2918
  • [5] INFLUENCE OF A DIRECT-CURRENT BIAS ON THE ENERGY OF IONS FROM AN ELECTRON-CYCLOTRON RESONANCE PLASMA
    REINKE, P
    SCHELZ, S
    JACOB, W
    MOLLER, W
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (03): : 434 - 438
  • [6] SHAMPINE LF, 1975, COMPUTER SIMULATIONS
  • [7] ELECTRON-ENERGY DISTRIBUTIONS IN ELECTRON-CYCLOTRON RESONANCE DISCHARGES FOR MATERIALS PROCESSING
    WENG, YL
    KUSHNER, MJ
    [J]. JOURNAL OF APPLIED PHYSICS, 1992, 72 (01) : 33 - 42
  • [8] 1989, ECR SOURCE OPERATION