KINETICS OF H-2 PASSIVATION OF PB CENTERS AT THE (111) SI-SIO2 INTERFACE

被引:223
作者
BROWER, KL
机构
来源
PHYSICAL REVIEW B | 1988年 / 38卷 / 14期
关键词
D O I
10.1103/PhysRevB.38.9657
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:9657 / 9666
页数:10
相关论文
共 40 条
[31]   RELAXATION OF (111)SILICON SURFACE ATOMS FROM STUDIES OF SI4H9 CLUSTERS [J].
REDONDO, A ;
GODDARD, WA ;
MCGILL, TC ;
SURRATT, GT .
SOLID STATE COMMUNICATIONS, 1976, 20 (08) :733-736
[32]   SOLUBILITY OF GASES IN GLASS .2. HE, NE, AND H2 IN FUSED SILICA [J].
SHACKELF.JF ;
STUDT, PL ;
FULRATH, RM .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (04) :1619-+
[33]   THERMODYNAMICS OF WATER AND HYDROGEN SOLUBILITY IN FUSED SILICA [J].
SHACKELFORD, JF ;
MASARYK, JS .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 1976, 21 (01) :55-64
[34]   DIFFUSION OF HELIUM ISOTOPES IN VITREOUS SILICA [J].
SHELBY, JE .
PHYSICAL REVIEW B, 1971, 4 (08) :2681-&
[35]   MOLECULAR-DIFFUSION AND SOLUBILITY OF HYDROGEN ISOTOPES IN VITREOUS SILICA [J].
SHELBY, JE .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (08) :3387-3394
[36]   ON THE PERMEATION OF HYDROGEN AND HELIUM IN SINGLE CRYSTAL SILICON AND GERMANIUM AT ELEVATED TEMPERATURES [J].
VANWIERINGEN, A ;
WARMOLTZ, N .
PHYSICA, 1956, 22 (10) :849-865
[37]   AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF THE THERMAL NITRIDATION OF SIO2/SI [J].
VASQUEZ, RP ;
MADHUKAR, A ;
GRUNTHANER, FJ ;
NAIMAN, ML .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (01) :226-233
[38]  
Vitko J., 1978, PHYSICS SIO2 ITS INT, P215
[39]   DEFECTS IN IRRADIATED SILICON - ELECTRON PARAMAGNETIC RESONANCE OF DIVACANCY [J].
WATKINS, GD ;
CORBETT, JW .
PHYSICAL REVIEW, 1965, 138 (2A) :A543-+
[40]  
WATKINS GD, 1986, MATERIALS SCI FORUM, V3, P953