AN X-RAY PHOTOELECTRON-SPECTROSCOPY STUDY OF THE THERMAL NITRIDATION OF SIO2/SI

被引：22

作者：

VASQUEZ, RP

MADHUKAR, A

GRUNTHANER, FJ

NAIMAN, ML

机构：

[1] MIT,LINCOLN LAB,LEXINGTON,MA 02173

[2] UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90089

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 01期

关键词：

D O I：

10.1063/1.337801

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：226 / 233

页数：8

共 50 条

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