MECHANISM AND KINETICS OF THE DIFFUSION OF GOLD IN SILICON

被引：307

作者：

GOSELE, U ^{[1
]}

FRANK, W ^{[1
]}

SEEGER, A ^{[1
]}

机构：

[1] UNIV STUTTGART, INST THEORET & ANGEW PHYS, D-7000 STUTTGART 80, FED REP GER

来源：

APPLIED PHYSICS | 1980年 / 23卷 / 04期

关键词：

D O I：

10.1007/BF00903217

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：361 / 368

页数：8

共 30 条

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