SILICON IN MECHANICAL SENSORS

[1] ABUZEID MM, 1984, J ELECTROCHEM SO SEP, P2138

[2] CANTILEVER-TYPE DISPLACEMENT SENSOR USING DIFFUSED SILICON STRAIN-GAUGES [J]. SENSORS AND ACTUATORS, 1982, 2 (03): : 297 - 307

[3] ALLAN R, 1984, HIGH TECHNOL, P43

[4] ALLAN R, 1980, ELECTRONICS 1106, P113

[5] ANISOTROPIC ETCHING OF SILICON - A MODEL DIFFUSION-CONTROLLED REACTION [J]. IEE PROCEEDINGS-I COMMUNICATIONS SPEECH AND VISION, 1983, 130 (02): : 49 - 56

[6] ANGELL JB, 1983, SCI AM APR, P36

[7] BAO MH, 1987, SENSOR ACTUATOR, V12, P49

[8] Barabash P. R., 1983, Sensors and Actuators, V4, P427, DOI 10.1016/0250-6874(83)85054-9

[9] BARTH PW, 1982, CHEMTECH NOV, P666

[10] FABRICATION OF NOVEL 3-DIMENSIONAL MICROSTRUCTURES BY ANISOTROPIC ETCHING OF (100) AND (110) SILICON [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (10) : 1178 - 1185

[1] ABUZEID MM, 1984, J ELECTROCHEM SO SEP, P2138

[2] CANTILEVER-TYPE DISPLACEMENT SENSOR USING DIFFUSED SILICON STRAIN-GAUGES [J]. SENSORS AND ACTUATORS, 1982, 2 (03): : 297 - 307

[3] ALLAN R, 1984, HIGH TECHNOL, P43

[4] ALLAN R, 1980, ELECTRONICS 1106, P113

[5] ANISOTROPIC ETCHING OF SILICON - A MODEL DIFFUSION-CONTROLLED REACTION [J]. IEE PROCEEDINGS-I COMMUNICATIONS SPEECH AND VISION, 1983, 130 (02): : 49 - 56

[6] ANGELL JB, 1983, SCI AM APR, P36

[7] BAO MH, 1987, SENSOR ACTUATOR, V12, P49

[8] Barabash P. R., 1983, Sensors and Actuators, V4, P427, DOI 10.1016/0250-6874(83)85054-9

[9] BARTH PW, 1982, CHEMTECH NOV, P666

[10] FABRICATION OF NOVEL 3-DIMENSIONAL MICROSTRUCTURES BY ANISOTROPIC ETCHING OF (100) AND (110) SILICON [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (10) : 1178 - 1185