SILICON IN MECHANICAL SENSORS

[51] Greewood J.C., 1988, P I ELECT ENG D, V135, P369

[52] Gross P R, 1967, Curr Top Dev Biol, V2, P1

[53] FINE-GRAINED POLYSILICON FILMS WITH BUILT-IN TENSILE STRAIN [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (06) : 800 - 801

[54] GUTGESELL H, 1983, ELECTRONICS POWE FEB, P175

[55] AN INTEGRATED CAPACITIVE PRESSURE SENSOR WITH FREQUENCY-MODULATED OUTPUT [J]. SENSORS AND ACTUATORS, 1986, 9 (04): : 345 - 351

[56] SILICON DIAPHRAGM PRESSURE SENSORS FABRICATED BY ANODIC-OXIDATION ETCH-STOP [J]. SENSORS AND ACTUATORS, 1988, 13 (01): : 63 - 70

[57] DIAPHRAGM THICKNESS CONTROL IN SILICON PRESSURE SENSORS USING AN ANODIC-OXIDATION ETCH-STOP [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8A) : 2037 - 2041

[58] FORMATION OF DEEP HOLES IN SILICON BY REACTIVE ION ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (02): : 594 - 600

[59] HOLMES L, 1983, ELECTRONICS POWE FEB, P178

[60] HIGH-Q SELECTIVE FILTERS USING MECHANICAL RESONANCE OF SILICON BEAMS [J]. IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS, 1978, 25 (04): : 215 - 222

[51] Greewood J.C., 1988, P I ELECT ENG D, V135, P369

[52] Gross P R, 1967, Curr Top Dev Biol, V2, P1

[53] FINE-GRAINED POLYSILICON FILMS WITH BUILT-IN TENSILE STRAIN [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (06) : 800 - 801

[54] GUTGESELL H, 1983, ELECTRONICS POWE FEB, P175

[55] AN INTEGRATED CAPACITIVE PRESSURE SENSOR WITH FREQUENCY-MODULATED OUTPUT [J]. SENSORS AND ACTUATORS, 1986, 9 (04): : 345 - 351

[56] SILICON DIAPHRAGM PRESSURE SENSORS FABRICATED BY ANODIC-OXIDATION ETCH-STOP [J]. SENSORS AND ACTUATORS, 1988, 13 (01): : 63 - 70

[57] DIAPHRAGM THICKNESS CONTROL IN SILICON PRESSURE SENSORS USING AN ANODIC-OXIDATION ETCH-STOP [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8A) : 2037 - 2041

[58] FORMATION OF DEEP HOLES IN SILICON BY REACTIVE ION ETCHING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (02): : 594 - 600

[59] HOLMES L, 1983, ELECTRONICS POWE FEB, P178

[60] HIGH-Q SELECTIVE FILTERS USING MECHANICAL RESONANCE OF SILICON BEAMS [J]. IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS, 1978, 25 (04): : 215 - 222