DIFFRACTION-LIMITED SOFT-X-RAY PROJECTION LITHOGRAPHY WITH A LASER PLASMA SOURCE

被引：18

作者：

KUBIAK, GD

TICHENOR, DA

MALINOWSKI, ME

STULEN, RH

HANEY, SJ

BERGER, KW

BROWN, LA

BJORKHOLM, JE

FREEMAN, RR

MANSFIELD, WM

TENNANT, DM

WOOD, OR

BOKOR, J

JEWELL, TE

WHITE, DL

WINDT, DL

WASKIEWICZ, WK

机构：

[1] AT&T BELL LABS,HOLMDEL,NJ 07733

[2] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 06期

关键词：

D O I：

10.1116/1.585313

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A laser plasma source of extreme ultraviolet and soft x-ray radiation has been used to print diffraction-limited features using soft x-ray projection lithography. A spherical condenser optic, a Si/Ge transmissive mask and a Mo/Si multilayer-coated Schwarzschild objective having 20:1 reduction ratio were employed to pattern selected single-layer and trilevel resists. At a numerical aperture of 0.12, a 0.1-mu-m line and space pattern is clearly delineated and weak modulation is observed for the analogous 0.05-mu-m pattern.

引用

页码：3184 / 3188

页数：5

共 23 条

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