MECHANICAL CHARACTERIZATION OF THIN-FILMS BY MICROMECHANICAL TECHNIQUES

[1] MICROFABRICATED STRUCTURES FOR THE INSITU MEASUREMENT OF RESIDUAL-STRESS, YOUNGS MODULUS, AND ULTIMATE STRAIN OF THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1987, 51 (04) : 241 - 243

[2] BACHER W, 1992, FEB P IEEE MICR EL M, P202

[3] INTERNAL-STRESS AND INTERNAL-FRICTION IN THIN-LAYER MICROELECTRONIC MATERIALS [J]. JOURNAL OF APPLIED PHYSICS, 1990, 67 (08) : 3661 - 3668

[4] BLAU PJ, 1986, ASTM STP, V889

[5] BOMAN M, 1992, FEB P IEEE MICR EL M, P162

[6] CALCULATED ELASTIC-CONSTANTS FOR STRESS PROBLEMS ASSOCIATED WITH SEMICONDUCTOR DEVICES [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (01) : 534 - 535

[7] BRUNGER WH, 1992, FEB IEEE MICR EL MEC, P168

[8] BURNS DW, 1990, J VAC SCI TECHNOL A, V8, P3606

[9] CONNALLY JA, 1991 INT C SOL STAT, P953

[10] DENG K, 1991 INT C SOL STAT, P213

[1] MICROFABRICATED STRUCTURES FOR THE INSITU MEASUREMENT OF RESIDUAL-STRESS, YOUNGS MODULUS, AND ULTIMATE STRAIN OF THIN-FILMS [J]. APPLIED PHYSICS LETTERS, 1987, 51 (04) : 241 - 243

[2] BACHER W, 1992, FEB P IEEE MICR EL M, P202

[3] INTERNAL-STRESS AND INTERNAL-FRICTION IN THIN-LAYER MICROELECTRONIC MATERIALS [J]. JOURNAL OF APPLIED PHYSICS, 1990, 67 (08) : 3661 - 3668

[4] BLAU PJ, 1986, ASTM STP, V889

[5] BOMAN M, 1992, FEB P IEEE MICR EL M, P162

[6] CALCULATED ELASTIC-CONSTANTS FOR STRESS PROBLEMS ASSOCIATED WITH SEMICONDUCTOR DEVICES [J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (01) : 534 - 535

[7] BRUNGER WH, 1992, FEB IEEE MICR EL MEC, P168

[8] BURNS DW, 1990, J VAC SCI TECHNOL A, V8, P3606

[9] CONNALLY JA, 1991 INT C SOL STAT, P953

[10] DENG K, 1991 INT C SOL STAT, P213