MICROFABRICATED STRUCTURES FOR THE INSITU MEASUREMENT OF RESIDUAL-STRESS, YOUNGS MODULUS, AND ULTIMATE STRAIN OF THIN-FILMS

被引：181

作者：

ALLEN, MG

MEHREGANY, M

HOWE, RT

SENTURIA, SD

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 51卷 / 04期

关键词：

D O I：

10.1063/1.98460

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：241 / 243

页数：3

共 17 条

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[7]

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[8] A SIMPLE TECHNIQUE FOR THE DETERMINATION OF MECHANICAL STRAIN IN THIN-FILMS WITH APPLICATIONS TO POLYSILICON [J].

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[9]

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[10] STRESS IN POLYCRYSTALLINE AND AMORPHOUS-SILICON THIN-FILMS [J].

HOWE, RT ;

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JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) :4674-4675

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