NEW HIGH-RATE SPUTTERING-TYPE ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMA USING AN ELECTRIC MIRROR

[1] STUDIES OF COLD CATHODE DISCHARGES IN MAGNETIC FIELDS [J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (12) : 1866 - 1869

[2] Bers A., 1963, WAVES ANISOTROPIC PL

[3] BEAM-PLASMA DISCHARGE - BUILDUP OF OSCILLATIONS [J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (12) : 3421 - &

[4] MANABE Y, 1988, 35TH SPRING M JAP SO, P405

[5] DENSE-PLASMA PRODUCTION FOR HIGH-RATE SPUTTERING BY MEANS OF AN ELECTRIC MIRROR [J]. APPLIED PHYSICS LETTERS, 1988, 53 (21) : 2025 - 2027

[6] PHOTOCHROMISM AND ANOMALOUS CRYSTALLITE ORIENTATION OF ZNO FILMS PREPARED BY A SPUTTERING-TYPE ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMA [J]. APPLIED PHYSICS LETTERS, 1988, 53 (15) : 1393 - 1395

[7] ION ENERGY ANALYSIS FOR SPUTTERING-TYPE ELECTRON-CYCLOTRON-RESONANCE MICROWAVE PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1988, 64 (10) : 5179 - 5182

[8] Ono T., 1985, 1985 Symposium on VLSI Technology. Digest of Technical Papers, P84

[9] ELECTRON-CYCLOTRON RESONANCE PLASMA DEPOSITION TECHNIQUE USING RAW-MATERIAL SUPPLY BY SPUTTERING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (08): : L534 - L536

[10] SAITO Y, 1987, 34TH SPRING M JAP SO, P464

[1] STUDIES OF COLD CATHODE DISCHARGES IN MAGNETIC FIELDS [J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (12) : 1866 - 1869

[2] Bers A., 1963, WAVES ANISOTROPIC PL

[3] BEAM-PLASMA DISCHARGE - BUILDUP OF OSCILLATIONS [J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (12) : 3421 - &

[4] MANABE Y, 1988, 35TH SPRING M JAP SO, P405

[5] DENSE-PLASMA PRODUCTION FOR HIGH-RATE SPUTTERING BY MEANS OF AN ELECTRIC MIRROR [J]. APPLIED PHYSICS LETTERS, 1988, 53 (21) : 2025 - 2027

[6] PHOTOCHROMISM AND ANOMALOUS CRYSTALLITE ORIENTATION OF ZNO FILMS PREPARED BY A SPUTTERING-TYPE ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMA [J]. APPLIED PHYSICS LETTERS, 1988, 53 (15) : 1393 - 1395

[7] ION ENERGY ANALYSIS FOR SPUTTERING-TYPE ELECTRON-CYCLOTRON-RESONANCE MICROWAVE PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1988, 64 (10) : 5179 - 5182

[8] Ono T., 1985, 1985 Symposium on VLSI Technology. Digest of Technical Papers, P84

[9] ELECTRON-CYCLOTRON RESONANCE PLASMA DEPOSITION TECHNIQUE USING RAW-MATERIAL SUPPLY BY SPUTTERING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (08): : L534 - L536

[10] SAITO Y, 1987, 34TH SPRING M JAP SO, P464