TEMPERATURE-DEPENDENCE OF 1/F NOISE IN EPITAXIAL N-TYPE GAAS

被引:22
作者
REN, L
HOOGE, FN
机构
[1] Department of Electrical Engineering, Eindhoven University of Technology, Eindhoven
来源
PHYSICA B | 1992年 / 176卷 / 03期
关键词
D O I
10.1016/0921-4526(92)90005-D
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The 1/f noise of n-type epitaxial GaAs was measured between 77 and 300 K. The 1/f noise turns out to be a fluctuation in the lattice scattering. At low temperatures alpha(latt) is-approximately-equal-to 7 x 10(-5). At high temperatures the noise generation is thermally activated with an activation energy of about 0.13 eV.
引用
收藏
页码:209 / 212
页数:4
相关论文
共 12 条
[1]   EXPERIMENTAL TEMPERATURE-DEPENDENCE OF 1/F FLUCTUATIONS IN GERMANIUM AND SILICON [J].
BISSCHOP, J ;
CUIJPERS, JL .
PHYSICA B & C, 1983, 123 (01) :6-10
[2]  
BISSCHOP J, 1983, THESIS EINDHOVEN U T
[3]   1/F NOISE IN ION-IMPLANTED RESISTORS BETWEEN 77-K AND 300-K [J].
CLEVERS, RHM .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (05) :1877-1881
[4]   VOLUME AND TEMPERATURE-DEPENDENCE OF THE 1/F NOISE PARAMETER-ALPHA IN SI [J].
CLEVERS, RHM .
PHYSICA B, 1989, 154 (02) :214-224
[5]  
CLEVERS RHM, 1988, THESIS EINDHOVEN U T
[6]   1-F NOISE - INFRARED PHENOMENON [J].
HANDEL, PH .
PHYSICAL REVIEW LETTERS, 1975, 34 (24) :1492-1495
[7]   EXPERIMENTAL STUDIES ON 1-F NOISE [J].
HOOGE, FN ;
KLEINPENNING, TGM ;
VANDAMME, LKJ .
REPORTS ON PROGRESS IN PHYSICS, 1981, 44 (05) :479-532
[8]  
Look D. C., 1989, ELECT CHARACTERIZATI
[9]   TEMPERATURE-DEPENDENCE OF 1/F NOISE IN SILICON [J].
LUO, J ;
LOVE, WF ;
MILLER, SC .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (09) :3196-3198
[10]   1/F NOISE AT ROOM-TEMPERATURE IN N-TYPE GAAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
REN, L ;
LEYS, MR .
PHYSICA B, 1991, 172 (03) :319-323