INSITU DIAMOND GROWTH-RATE MEASUREMENT USING EMISSION INTERFEROMETRY

被引：61

作者：

SNAIL, KA

MARKS, CM

机构：

[1] Optical Sciences Division, Code 6522, Naval Research Laboratory, Washington

来源：

APPLIED PHYSICS LETTERS | 1992年 / 60卷 / 25期

关键词：

D O I：

10.1063/1.106747

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The growth rate of diamond synthesized in an oxygen-acetylene flame has been measured in situ with an infrared pyrometer. During the growth, the sample's emitted radiation intensity is modulated in time by interference phenomena in the growing diamond film, causing a periodic variation of the pyrometer's apparent temperature reading. Diamond film growth rates determined from the period of these oscillations agree well with rates derived from the film thickness. This technique is used to determine the variation of diamond growth rate with substrate temperature over the range of 444-1200-degrees-C. An Arrhenius analysis of the data shows two distinct diamond growth regimes.

引用

页码：3135 / 3137

页数：3

共 20 条

[11] DETERMINATION OF ACTIVATION-ENERGIES FOR DIAMOND GROWTH BY AN ADVANCED HOT FILAMENT CHEMICAL VAPOR-DEPOSITION METHOD [J].