AN INVESTIGATION OF THE OXIDATION OF TI-W

被引：8

作者：

TOMPKINS, HG

LYTLE, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 06期

关键词：

D O I：

10.1063/1.341550

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3269 / 3272

页数：4

共 34 条

[1]

Azzam RMA, 1977, ELLIPSOMETRY POLARIZ

[2] TITANIUM-TUNGSTEN CONTACTS TO SI - THE EFFECTS OF ALLOYING ON SCHOTTKY CONTACT AND ON SILICIDE FORMATION [J].

BABCOCK, SE ;

TU, KN .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (10) :6898-6905

[3] OPTICAL-PROPERTIES OF TUNGSTEN-OXIDE FILMS AS A FUNCTION OF THEIR STOICHIOMETRY AS DETERMINED BY LIMA AND XPS [J].

BISHOP, CA ;

EDGE, G ;

SUTHERLAND, I ;

HOWSON, RP .

VACUUM, 1987, 37 (3-4) :279-282

[4]

BUCH J, 1987, VACUUM, V36, P561

[5] INTER-DIFFUSION AND COMPOUND FORMATION IN THE C-SI/PTSI/(TI-W)/A1 SYSTEM [J].

CANALI, C ;

CELOTTI, G ;

FANTINI, F ;

ZANONI, E .

THIN SOLID FILMS, 1982, 88 (01) :9-23

[6] CORROSION RESISTANCE OF SEVERAL INTEGRATED-CIRCUIT METALLIZATION SYSTEMS [J].

CUNNINGHAM, JA ;

FULLER, CR ;

HAYWOOD, CT .

IEEE TRANSACTIONS ON RELIABILITY, 1970, R 19 (04) :182-+

[7] ATMOSPHERIC OXIDATION OF ALPHA TITANIUM - ROLE OF OXIDE-FILMS AND OXIDATION MECHANISM [J].

DECHAMPS, M ;

LEHR, P .

JOURNAL OF THE LESS-COMMON METALS, 1977, 56 (02) :193-207

[8] CHARACTERISTICS OF TIO2 FILMS DEPOSITED BY A REACTIVE IONIZED CLUSTER BEAM [J].

FUKUSHIMA, K ;

YAMADA, I ;

TAKAGI, T .

JOURNAL OF APPLIED PHYSICS, 1985, 58 (11) :4146-4149

[9] APPLICATION OF TI-W BARRIER METALLIZATION FOR INTEGRATED-CIRCUITS [J].

GHATE, PB ;

BLAIR, JC ;

FULLER, CR ;

MCGUIRE, GE .

THIN SOLID FILMS, 1978, 53 (02) :117-128

[10]

GORBOUNOVA KM, 1958, P ACAD SCI USSR, V119, P151

← 1 2 3 4 →