PARAMETRIC INVESTIGATION FOR DIRECT CHEMICAL-VAPOR-DEPOSITION OF MAGNETITE FILMS

被引:4
作者
DHARA, S
AWASTHY, BR
RASTOGI, AC
DAS, BK
GELFOND, NV
FEDOTOVA, NE
BYKOV, AF
IGUMENOV, IK
机构
[1] NATL PHYS LAB,DIV MAT,DR KS KRISHNAN MARG,NEW DELHI 110012,INDIA
[2] RUSSIAN ACAD SCI,INST INORGAN CHEM,SIBERIAN DEPT,NOVOSIBIRSK,RUSSIA
关键词
D O I
10.1016/0304-8853(94)90068-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A direct growth of magnetite (Fe3O4) phase has been obtained by a low-pressure chemical vapour deposition (LPCVD) technique using metal-organic ferric dipivaloylmethanate (Fe(DPM)3) as precursor. On oxidation these films are converted to gamma-Fe2O3 phase which give superior magnetic coercivity values. Crystallographic structures are determined by small-angle XRD analysis. As-deposited magnetite and oxidized gamma-Fe2O3 films are reported with coercivity values of 93 and 122 kA/m, respectively. Squareness ratios of 0.80 are observed for both as-deposited Fe3O4 and oxidized gamma-Fe2O3 films with remanent magnetization values of 101 and 102 mT, respectively. Deposition conditions of the as-deposited films along with a growth mechanism involving a gas phase reaction, as promoted by a hot wall type reactor chamber, are described.
引用
收藏
页码:29 / 33
页数:5
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