2-DIMENSIONAL MODEL OF ION DYNAMICS DURING PLASMA SOURCE ION-IMPLANTATION

被引：47

作者：

SHERIDAN, TE ^{[1
]}

ALPORT, MJ ^{[1
]}

机构：

[1] UNIV NATAL,DEPT PHYS,PLASMA PHYS RES INST,DURBAN 4001,SOUTH AFRICA

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 14期

关键词：

D O I：

10.1063/1.111807

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Ion dynamics in the plasma sheath following the application of a negative voltage pulse to a two-dimensional target are modeled using a time-dependent, two-fluid simulation. The target considered is a square bar of infinite length. We find that the sheath focuses ions near to, but not on, the comer of the bar, resulting in an enhancement of the dose received there.

引用

页码：1783 / 1785

页数：3

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