STUDIES BY PHOTOTHERMAL DEFLECTION SPECTROSCOPY OF DEFECT FORMATION IN A-SI-H

被引:16
作者
THEYE, ML
CHAHED, L
CABARROCAS, PRI
ZELLAMA, K
机构
[1] ECOLE POLYTECH,PHYS INTERFACES & COUCHES MINCES LAB,CNRS,UNITE 258,F-91128 PALAISEAU,FRANCE
[2] UNIV PARIS 07,ECOLE NORMALE SUPER,PHYS SOLIDES GRP,CNRS,UNITE 17,F-75251 PARIS 05,FRANCE
来源
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 1991年 / 63卷 / 01期
关键词
D O I
10.1080/01418639108224435
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The optical absorption spectra determined between 2 and 0.6 eV by a combination of optical transmission and photothermal deflection spectroscopy measurements for two a-Si:H samples deposited at 100 and 250-degrees-C have been carefully compared in the as-deposited, annealed and light-soaked states. The results as a whole are interpreted in a quantitative way by the recently proposed weak-bond-to-dangling-bond conversion model.
引用
收藏
页码:143 / 150
页数:8
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