LASER-INDUCED FLUORESCENCE OBSERVATION OF IN-ATOMS PRODUCED BY DC REACTIVE SPUTTERING OF INDIUM-TIN-OXIDE TARGET

被引:9
作者
MATSUDA, Y
KIDO, T
ANO, K
SHIRAKATA, K
FUJIYAMA, H
机构
[1] Department of Electrical Engineering and Computer Science, Nagasaki University
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 7B期
关键词
LASER-INDUCED FLUORESCENCE; INDIUM ATOM; REACTIVE SPUTTERING; ITO; RAYLEIGH SCATTERING; ABSOLUTE DENSITY;
D O I
10.1143/JJAP.33.4469
中图分类号
O59 [应用物理学];
学科分类号
摘要
Spatial density profiles of sputtered In-atoms in a de glow discharge with an indium-tin-oxide (ITO) cathode were measured by laser-induced fluorescence (LIF) spectroscopy. The absolute density of In-atoms was obtained by calibrating the LIF signal with the Rayleigh scattering signal for Ar. The spatial density profile of In-atoms had a peak at a certain distance from the cathode, and this peak density was about 10(11) cm(-3) for pure Ar de discharge at 0.2 Torr and 0.6 Wcm(-2) The behavior of spatial profiles of the absolute In-density was investigated as a function of de discharge power, total pressure (Ar+O-2), and O-2 partial pressure. Addition of a small amount of O-2 caused a drastic change in both the absolute In-density and its spatial distribution. From these observations, the reactive sputtering mechanism in a de glow discharge is discussed.
引用
收藏
页码:4469 / 4472
页数:4
相关论文
共 15 条
[11]   OXYGEN UNDERLAYER FORMATION ON TITANIUM BY STATIC-MODE LASER FLUORESCENCE AND AUGER-SPECTROSCOPY [J].
PELLIN, MJ ;
YOUNG, CE ;
GRUEN, DM ;
ARATONO, Y ;
DEWALD, AB .
SURFACE SCIENCE, 1985, 151 (2-3) :477-502
[12]   STUDIES ON GLOW-DISCHARGE CHARACTERISTICS DURING DC REACTIVE MAGNETRON SPUTTERING [J].
RAO, GM ;
MOHAN, S .
JOURNAL OF APPLIED PHYSICS, 1991, 69 (09) :6652-6655
[13]   ENERGETIC BINARY COLLISIONS IN RARE-GAS PLASMAS [J].
ROBINSON, RS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02) :185-188
[14]   LASER-INDUCED FLUORESCENCE SPECTROSCOPY FOR THE DETERMINATION OF THE ABSOLUTE DENSITY AND SPATIAL-DISTRIBUTION OF SI ATOMS IN A SIH4-HE-AR GLOW-DISCHARGE [J].
TAKUBO, Y ;
TAKASUGI, Y ;
YAMAMOTO, M .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (03) :1050-1054
[15]   RF REACTIVE SPUTTERING OF INDIUM-TIN-OXIDE FILMS [J].
TVAROZEK, V ;
NOVOTNY, I ;
HARMAN, R ;
KOVAC, J .
VACUUM, 1986, 36 (7-9) :479-482