CRYSTAL SILICON FABRY-PEROT CAVITIES DEPOSITED WITH DICHLOROSILANE IN A REDUCED PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR FOR THERMAL SENSING

被引:2
作者
CHAO, HC [1 ]
NEUDECK, GW [1 ]
机构
[1] PURDUE UNIV,SCH ELECT ENGN,W LAFAYETTE,IN 47906
关键词
CHEMICAL VAPOR DEPOSITION; FABRY-PEROT RESONATORS; SILICON-ON-INSULATOR;
D O I
10.1049/el:19950708
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A surface-normal Fabry-Perot (FP)thermal sensor with embedded multiple QW dielectric mirrors, was fabricated and evaluated using a single crystal merged silicon epitaxial lateral overgrowth (MELO) technique. The sensitivity of the sensor has been improved owing to the higher finesse.
引用
收藏
页码:1101 / 1102
页数:2
相关论文
共 7 条
[1]   REFRACTIVE-INDEX OF GA1-XALXAS [J].
AFROMOWITZ, MA .
SOLID STATE COMMUNICATIONS, 1974, 15 (01) :59-63
[2]   POLYSILICON FABRY-PEROT CAVITIES DEPOSITED WITH DICHLOROSILANE IN A REDUCED PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR FOR THERMAL SENSING [J].
CHAO, HC ;
NEUDECK, GW .
ELECTRONICS LETTERS, 1994, 30 (01) :80-81
[3]   TEMPERATURE-DEPENDENCE OF THE PROPERTIES OF DBR MIRRORS USED IN SURFACE NORMAL OPTOELECTRONIC DEVICES [J].
DUDLEY, JJ ;
CRAWFORD, DL ;
BOWERS, JE .
IEEE PHOTONICS TECHNOLOGY LETTERS, 1992, 4 (04) :311-314
[4]   A NEW METHOD OF FORMING A THIN SINGLE-CRYSTAL SILICON DIAPHRAGM USING MERGED EPITAXIAL LATERAL OVERGROWTH FOR SENSOR APPLICATIONS [J].
PAK, JJ ;
NEUDECK, GW ;
KABIR, AE ;
DEROO, DW ;
STALLER, SE ;
LOGSDON, JH .
IEEE ELECTRON DEVICE LETTERS, 1991, 12 (11) :614-616
[5]   LARGE AREA SILICON ON INSULATOR BY DOUBLE-MERGED EPITAXIAL LATERAL OVERGROWTH [J].
SUBRAMANIAN, CK ;
NEUDECK, GW .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (02) :643-647
[6]   BEHAVIOR OF ELECTRONIC DIELECTRIC CONSTANT IN COVALENT AND IONIC MATERIALS [J].
WEMPLE, SH ;
DIDOMENI.M .
PHYSICAL REVIEW B, 1971, 3 (04) :1338-&
[7]   THE EFFECT OF PROCESS PARAMETER VARIATION ON POLYSILICON TEMPERATURE TRANSDUCER CHARACTERISTICS [J].
ZUCKER, O ;
LANGHEINRICH, W ;
MEYER, J .
SENSORS AND ACTUATORS A-PHYSICAL, 1992, 32 (1-3) :419-422