STRAINS IN SI-ON-SIO2 STRUCTURES FORMED BY OXYGEN IMPLANTATION - RAMAN-SCATTERING CHARACTERIZATION

被引：29

作者：

OLEGO, DJ ^{[1
]}

BAUMGART, H ^{[1
]}

CELLER, GK ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 06期

关键词：

D O I：

10.1063/1.99451

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：483 / 485

页数：3

共 15 条

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