SUBMICROMETER MOSFET STRUCTURE FOR MINIMIZING HOT-CARRIER GENERATION

被引:113
作者
TAKEDA, E
KUME, H
TOYABE, T
ASAI, S
机构
关键词
D O I
10.1109/T-ED.1982.20752
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:611 / 618
页数:8
相关论文
共 19 条
  • [1] HOT-CARRIER INSTABILITY IN IGFETS
    ABBAS, SA
    DOCKERTY, RC
    [J]. APPLIED PHYSICS LETTERS, 1975, 27 (03) : 147 - 148
  • [2] ANTONIADIS DA, 1978, 50192 STANF EL LAB T
  • [3] ASAI S, 1974, J VAC SCI TECHNOL, V16, P1710
  • [4] HOT-ELECTRON EMISSION IN N-CHANNEL IGFETS
    COTTRELL, PE
    TROUTMAN, RR
    NING, TH
    [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1979, 14 (02) : 442 - 455
  • [5] DESIGN OF ION-IMPLANTED MOSFETS WITH VERY SMALL PHYSICAL DIMENSIONS
    DENNARD, RH
    GAENSSLEN, FH
    YU, HN
    RIDEOUT, VL
    BASSOUS, E
    LEBLANC, AR
    [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1974, SC 9 (05) : 256 - 268
  • [6] SIZE EFFECTS IN E-BEAM FABRICATED MOS DEVICES
    ELLIOTT, MT
    SPLINTER, MR
    JONES, AB
    REEKSTIN, JP
    [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1979, 14 (02) : 391 - 397
  • [7] THRESHOLD-VOLTAGE INSTABILITY IN MOSFETS DUE TO CHANNEL HOT-HOLE EMISSION
    FAIR, RB
    SUN, RC
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (01) : 83 - 94
  • [8] KAMIGAKI Y, UNPUB N CHANNEL MOSF
  • [9] Koyanagi M., 1979, JPN J APPL PHYS S, V18
  • [10] 1 MU-M MOSFET VLSI TECHNOLOGY .4. HOT-ELECTRON DESIGN CONSTRAINTS
    NING, TH
    COOK, PW
    DENNARD, RH
    OSBURN, CM
    SCHUSTER, SE
    YU, HN
    [J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1979, 14 (02) : 268 - 275