MECHANISMS OF GAAS GROWTH USING TERTIARYBUTYLARSINE AND TRIMETHYLGALLIUM

被引:27
作者
LARSEN, CA [1 ]
LI, SH [1 ]
BUCHAN, NI [1 ]
STRINGFELLOW, GB [1 ]
机构
[1] UNIV UTAH,DEPT ELECT ENGN,SALT LAKE CITY,UT 84112
关键词
D O I
10.1016/0022-0248(89)90091-2
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:673 / 682
页数:10
相关论文
共 10 条
  • [1] BUCHAN NI, 1988, J CRYST GROWTH, V92, P951
  • [2] USE OF TERTIARYBUTYLARSINE FOR GAAS GROWTH
    CHEN, CH
    LARSEN, CA
    STRINGFELLOW, GB
    [J]. APPLIED PHYSICS LETTERS, 1987, 50 (04) : 218 - 220
  • [3] HAAKE G, COMMUNICATION
  • [4] THE INFLUENCE OF GROWTH CHEMISTRY ON THE MOVPE GROWTH OF GAAS AND ALXGA1-XAS LAYERS AND HETEROSTRUCTURES
    KUECH, TF
    VEUHOFF, E
    KUAN, TS
    DELINE, V
    POTEMSKI, R
    [J]. JOURNAL OF CRYSTAL GROWTH, 1986, 77 (1-3) : 257 - 271
  • [5] REACTION-MECHANISMS IN THE ORGANOMETALLIC VAPOR-PHASE EPITAXIAL-GROWTH OF GAAS
    LARSEN, CA
    BUCHAN, NI
    STRINGFELLOW, GB
    [J]. APPLIED PHYSICS LETTERS, 1988, 52 (06) : 480 - 482
  • [6] DECOMPOSITION MECHANISMS OF TERTIARYBUTYLARSINE
    LARSEN, CA
    BUCHAN, NI
    LI, SH
    STRINGFELLOW, GB
    [J]. JOURNAL OF CRYSTAL GROWTH, 1989, 94 (03) : 663 - 672
  • [7] USE OF TERTIARYBUTYLARSINE IN THE METALORGANIC CHEMICAL VAPOR-DEPOSITION GROWTH OF GAAS
    LUM, RM
    KLINGERT, JK
    LAMONT, MG
    [J]. APPLIED PHYSICS LETTERS, 1987, 50 (05) : 284 - 286
  • [8] LUM RM, 1988, 30TH EL MAT C BOULD
  • [9] RESIDUAL DONORS AND ACCEPTORS IN HIGH-PURITY GAAS AND INP GROWN BY HYDRIDE VPE
    SKROMME, BJ
    LOW, TS
    ROTH, TJ
    STILLMAN, GE
    KENNEDY, JK
    ABROKWAH, JK
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 1983, 12 (02) : 433 - 457
  • [10] NON-HYDRIDE GROUP-V SOURCES FOR OMVPE
    STRINGFELLOW, GB
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 1988, 17 (04) : 327 - 335