ENHANCEMENT OF THE NEGATIVE-ION FLUX TO SURFACES FROM RADIO-FREQUENCY PROCESSING DISCHARGES

被引：62

作者：

OVERZET, LJ

BEBERMAN, JH

VERDEYEN, JT

机构：

[1] UNIV ILLINOIS,CTR COMPOUND SEMICOND MICROELECTR,CHAMPAIGN,IL 61820

[2] UNIV ILLINOIS,COORDINATED SCI LAB,CHAMPAIGN,IL 61820

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 04期

关键词：

D O I：

10.1063/1.344376

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1622 / 1631

页数：10

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