DIFFUSION OF COBALT AND TITANIUM IN SIO2

被引：18

作者：

BATEN, J

OFFENBERG, M

EMMERICHS, U

BALK, P

GRUNTHANER, PJ

EWERT, S

机构：

[1] CALTECH,JET PROP LAB,PASADENA,CA 91109

[2] RHEIN WESTFAL TH AACHEN,INST PHYS 2,D-5100 AACHEN,FED REP GER

来源：

APPLIED SURFACE SCIENCE | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90441-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：266 / 272

页数：7

共 11 条

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REUTERS PJ, 1988, P ESSDERC 1988, P45

[10] DIFFUSION OF ION-IMPLANTED ARSENIC IN THERMALLY GROWN SIO2-FILMS [J].

SINGH, R ;

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