ULTRATHIN POLY(METHYLMETHACRYLATE) RESIST FILMS FOR MICROLITHOGRAPHY

[1] NOVEL MONTE-CARLO SIMULATION OF SPACE-CHARGE-INDUCED ENERGY BROADENING IN LASER IRRADIATED CATHODES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 1989 - 1994

[2] MONTE-CARLO CALCULATION OF LOW-ENERGY ELECTRON-EMISSION FROM SURFACES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2057 - 2060

[3] BINNIG G, 1982, PJHYS REV LETT, V49, P47

[4] Bishop H.E., 1976, NBS SPEC PUBL, V460, P5

[5] ELECTRON SCATTERING IN THICK TARGETS [J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1967, 18 (06): : 703 - &

[6] Films built by depositing successive monomolecular layers on a solid surface [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1935, 57 (01) : 1007 - 1022

[7] RESOLUTION LIMITS OF PMMA RESIST FOR EXPOSURE WITH 50 KV ELECTRONS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (01) : 166 - 170

[8] CHANG THP, 1969, 10TH P S EL ION LAS, P97

[9] NANOWRITER - A NEW HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR NANOMETER-SCALE FABRICATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2009 - 2013

[10] Gozdz A. S., 1988, Proceedings of the SPIE - The International Society for Optical Engineering, V923, P172, DOI 10.1117/12.945646

[1] NOVEL MONTE-CARLO SIMULATION OF SPACE-CHARGE-INDUCED ENERGY BROADENING IN LASER IRRADIATED CATHODES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 1989 - 1994

[2] MONTE-CARLO CALCULATION OF LOW-ENERGY ELECTRON-EMISSION FROM SURFACES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2057 - 2060

[3] BINNIG G, 1982, PJHYS REV LETT, V49, P47

[4] Bishop H.E., 1976, NBS SPEC PUBL, V460, P5

[5] ELECTRON SCATTERING IN THICK TARGETS [J]. BRITISH JOURNAL OF APPLIED PHYSICS, 1967, 18 (06): : 703 - &

[6] Films built by depositing successive monomolecular layers on a solid surface [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1935, 57 (01) : 1007 - 1022

[7] RESOLUTION LIMITS OF PMMA RESIST FOR EXPOSURE WITH 50 KV ELECTRONS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (01) : 166 - 170

[8] CHANG THP, 1969, 10TH P S EL ION LAS, P97

[9] NANOWRITER - A NEW HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR NANOMETER-SCALE FABRICATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2009 - 2013

[10] Gozdz A. S., 1988, Proceedings of the SPIE - The International Society for Optical Engineering, V923, P172, DOI 10.1117/12.945646