EFFECTS OF DC SUBSTRATE BIAS ON PROPERTIES OF RF-SPUTTERED AMORPHOUS-GERMANIUM DITELLURIDE FILMS

被引:19
作者
FAGEN, EA [1 ]
NOWICKI, RS [1 ]
SEGUIN, RW [1 ]
机构
[1] ENERGY CONVERSION DEVICES INC,TROY,MI 48084
关键词
D O I
10.1063/1.1663015
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:50 / 59
页数:10
相关论文
共 25 条
[1]   DC BIAS-SPUTTERED ALUMINUM FILMS [J].
BLACHMAN, AG .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01) :299-302
[2]   STRESS AND RESISTIVITY CONTROL IN SPUTTERED MOLYBDENUM FILMS AND COMPARISON WITH SPUTTERED GOLD [J].
BLACHMAN, AG .
METALLURGICAL TRANSACTIONS, 1971, 2 (03) :699-&
[3]   PARTIAL PRESSURES IN EQUILIBRIUM WITH GROUP 4 TELLURIDES .3. GERMANIUM TELLURIDE [J].
BREBRICK, RF .
JOURNAL OF CHEMICAL PHYSICS, 1964, 41 (04) :1140-&
[4]  
COBIC B, 1961, BRIT J APPL PHYS, V12, P288
[5]  
DeNeufville J. P., 1972, J NON-CRYST SOLIDS, V8-10, P85
[6]  
DEVENYI A, P INT C SEMICONDUCTO, V4, P105
[7]   ALUMINUM FILMS DEPOSITED BY RF SPUTTERING [J].
DHEURLE, FM .
METALLURGICAL TRANSACTIONS, 1970, 1 (03) :725-&
[8]  
DHEURLE FM, 1966, T METALL SOC AIME, V236, P321
[9]   THERMALLY STIMULATED ARGON RELEASE FROM AMORPHOUS ALLOY FILMS [J].
FAGEN, EA .
MATERIALS RESEARCH BULLETIN, 1972, 7 (04) :279-&
[10]  
Fritzsche H., 1970, Journal of Non-Crystalline Solids, V2, P148, DOI 10.1016/0022-3093(70)90130-4