REDISTRIBUTION OF IMPLANTED DOPANTS AFTER METAL-SILICIDE FORMATION

被引：94

作者：

WITTMER, M

SEIDEL, TE

机构：

[1] CALTECH,PASADENA,CA 91125

[2] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF APPLIED PHYSICS | 1978年 / 49卷 / 12期

关键词：

D O I：

10.1063/1.324599

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5827 / 5834

页数：8

共 31 条

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