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COMPUTATIONAL MODEL OF REACTIVE SPUTTERING

被引：1
作者：
KOSS, VA
IOFFE, IV
BELKIND, A
机构：
[1] The BOC Group Technical Center, Murray Hill
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1993年 / 11卷 / 03期
关键词：
Condensed matter physics - Vacuum technology - Magnetrons - Reactive sputtering;
D O I：
10.1116/1.578794
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 [材料科学与工程]; 080502 [材料学];
摘要：
The model of reactive sputtering is modified to contain only measurable integral characteristics such as total current, discharge power, target erosion rate and volt-ampere characteristics for sputtering in metallic and reactive modes. Calculation results for Zn/ZnO and Zr/ZrN are in good agreement with experimental data.
引用
收藏
页码：701 / 703
页数：3
相关论文
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