ELECTRON-BEAM INDUCED SURFACE NUCLEATION AND LOW-TEMPERATURE DECOMPOSITION OF METAL-CARBONYLS

被引：75

作者：

KUNZ, RR ^{[1
]}

MAYER, TM ^{[1
]}

机构：

[1] UNIV N CAROLINA,DEPT CHEM,CHAPEL HILL,NC 27599

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 05期

关键词：

D O I：

10.1116/1.584214

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1557 / 1564

页数：8

相关论文

共 22 条

[1] BEAUCHAMP JL, 1982, J CHEM PHYS, V76, P2959
[2] SURFACE CHEMICAL-REACTIONS IN THE METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION OF ALUMINUM FILMS
BENT, BE
NUZZO, RG
DUBOIS, LH
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1920 - 1922
[3] BIDINOSTI DR, 1967, CAN J CHEM, V67, P641
[4] FORMATION OF GAS-PHASE NEGATIVE-IONS IN FE(CO)5 AND NI(CO)4
COMPTON, RN
STOCKDALE, JAD
[J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 1976, 22 (1-2) : 47 - 55
[5] EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P973
[6] LASER PHOTOELECTRON SPECTROMETRY OF THE NEGATIVE-IONS OF IRON AND IRON CARBONYLS - ELECTRON-AFFINITY DETERMINATION FOR THE SERIES FE(CO)N, N= 0, 1, 2, 3, 4
ENGELKING, PC
LINEBERGER, WC
[J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1979, 101 (19) : 5569 - 5573
[7] CHEMICAL VAPOR-DEPOSITION ON SILICON - INSITU SURFACE STUDIES
FOORD, JS
JACKMAN, RB
[J]. CHEMICAL PHYSICS LETTERS, 1984, 112 (02) : 190 - 194
[8] GEORGE PM, 1981, THESIS CALTECH
[9] DEPOSITION OF MOLYBDENUM AND TUNGSTEN FILMS FROM VAPOR DECOMPOSITION OF CARBONYLS
KAPLAN, LH
DHEURLE, FM
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (05) : 693 - &
[10] SELECTIVE AREA DEPOSITION OF METALS USING LOW-ENERGY ELECTRON-BEAMS
KUNZ, RR
ALLEN, TE
MAYER, TM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (05): : 1427 - 1431