STABILIZATION AND REMOVAL OF THE NATIVE OXIDES AT THE SURFACE OF (100)INP BY LOW-PRESSURE EXPOSURE TO NH3

被引：12

作者：

MOISON, JM

NISSIM, YI

LICOPPE, C

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 08期

关键词：

D O I：

10.1063/1.344046

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3824 / 3830

页数：7

共 22 条

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