INFLUENCE OF DIFFERENT DEPOSITION PARAMETERS ON THE PROPERTIES OF HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED BY MAGNETRON SPUTTERING

被引：10

作者：

DAS, D

BANERJEE, R

BATABYAL, AK

BARUA, AK

机构：

[1] Indian Assoc for the Cultivation of, Science, Calcutta, India, Indian Assoc for the Cultivation of Science, Calcutta, India

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1988年 / 103卷 / 01期

关键词：

This work has been done under a project funded by the Department of Non-Conventional Energy Sources; Govt. of India;

D O I：

10.1016/0022-3093(88)90427-9

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：143 / 148

页数：6

共 12 条

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