LATTICE ORIENTATION OF MICROCRYSTALLITES IN MU-C-SI-H

[1] Chopra K.L, 1969, THIN FILM PHENOMENA

[2] KINETICS OF ATOMIC-HYDROGEN REACTIONS IN GAS-PHASE [J]. CHEMICAL REVIEWS, 1973, 73 (05) : 407 - 440

[3] PHOTOCHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILMS FROM DISILANE AND TRISILANE USING A LOW-PRESSURE MERCURY LAMP [J]. APPLIED PHYSICS LETTERS, 1986, 48 (20) : 1380 - 1382

[4] FORMATION KINETICS AND CONTROL OF MICROCRYSTALLITE IN MU-C-SI-H FROM GLOW-DISCHARGE PLASMA [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) : 767 - 774

[5] HYDROGENATED AMORPHOUS-SILICON PREPARED BY ARF AND F2 EXCIMER LASER-INDUCED PHOTOCHEMICAL VAPOR-DEPOSITION [J]. APPLIED PHYSICS LETTERS, 1987, 51 (23) : 1925 - 1927

[6] AR(3P2) INDUCED CHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON [J]. APPLIED PHYSICS LETTERS, 1985, 46 (06) : 584 - 586

[7] TOYOSHIMA Y, 1985, 12TH INT C PHOT TOK

[8] AMORPHOUS SILICON RE, VA

[1] Chopra K.L, 1969, THIN FILM PHENOMENA

[2] KINETICS OF ATOMIC-HYDROGEN REACTIONS IN GAS-PHASE [J]. CHEMICAL REVIEWS, 1973, 73 (05) : 407 - 440

[3] PHOTOCHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FILMS FROM DISILANE AND TRISILANE USING A LOW-PRESSURE MERCURY LAMP [J]. APPLIED PHYSICS LETTERS, 1986, 48 (20) : 1380 - 1382

[4] FORMATION KINETICS AND CONTROL OF MICROCRYSTALLITE IN MU-C-SI-H FROM GLOW-DISCHARGE PLASMA [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1983, 59-6 (DEC) : 767 - 774

[5] HYDROGENATED AMORPHOUS-SILICON PREPARED BY ARF AND F2 EXCIMER LASER-INDUCED PHOTOCHEMICAL VAPOR-DEPOSITION [J]. APPLIED PHYSICS LETTERS, 1987, 51 (23) : 1925 - 1927

[6] AR(3P2) INDUCED CHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON [J]. APPLIED PHYSICS LETTERS, 1985, 46 (06) : 584 - 586

[7] TOYOSHIMA Y, 1985, 12TH INT C PHOT TOK

[8] AMORPHOUS SILICON RE, VA