DISLOCATION EFFECT IN DIFFUSION OF COPPER IN THERMALLY CONVERTED GALLIUM ARSENIDE

被引:4
作者
METTLER, K
机构
[1] Forschungslaboratorium der Siemens AG, München
关键词
D O I
10.1016/0038-1101(69)90107-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The effect of dislocations on the diffusion behaviour of copper in gallium arsenide has been studied, using crystals that have turned from n- to p-type on annealing due to copper acceptor formation. The acceptor density, which is determined from photoluminescence and conductivity measurements, augments with increasing dislocation density, and can be reversibly altered by further annealing. From this it is shown quantitatively that dislocations act as sources and sinks respectively for the diffusion and precipitation of copper in GaAs, and for 600°C a diffusion coefficient of 5 × 10-10 cm2 sec-1 has been found. Values of the same order have been obtained by extracting copper from GaAs in gallium, and have also been confirmed from literature data. Finally, indications have been found which show that copper diffuses much faster along dislocations than in dislocation-free bulk material. © 1969.
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页码:519 / &
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