DC REACTIVELY SPUTTERED IRON-OXIDE FILMS FOR SELECTIVELY SEMITRANSPARENT PHOTOMASKS .1. DEPOSITION CONDITIONS AND OPTICAL-PROPERTIES OF THE FILMS

被引：4

作者：

ORLINOV, V ^{[1
]}

GORANCHEV, B ^{[1
]}

SAROV, G ^{[1
]}

TSANEVA, V ^{[1
]}

机构：

[1] INST SEMICONDUCTOR TECH, BOTEVGRAD, BULGARIA

来源：

关键词：

D O I：

10.1016/0040-6090(80)90296-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：125 / 133

页数：9

共 14 条

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[3] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES
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[4] JANUS AR, 1973, SOLID STATE TECHNOL, V16, P33
[5] CHEMICAL VAPOR DEPOSITION OF IRON OXIDE FILMS FOR USE AS SEMITRANSPARENT MASKS
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (05) : 776 - +
[6] Orlinov V., 1975, Bulgarian Journal of Physics, V2, P441
[7] Orlinov V., 1975, Bulgarian Journal of Physics, V2, P431
[8] ORLINOV V, 1975, 6TH P YUG VAC C POST, P173
[9] Orlinov V. I., 1975, Bulgarian Journal of Physics, V2, P156
[10] SPUTTERED FE2O3 FILMS FOR USE IN SEE THROUGH MASKS
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (03) : 305 - &