THE THERMAL-OXIDATION OF SILICON - THE SPECIAL CASE OF THE GROWTH OF VERY THIN-FILMS

被引：101

作者：

ROCHET, F

RIGO, S

FROMENT, M

DANTERROCHES, C

MAILLOT, C

ROULET, H

DUFOUR, G

机构：

[1] UNIV PARIS 06,F-75230 PARIS 05,FRANCE

[2] CTR NATL ETUD TELECOMMUN,F-38243 MEYLAN,FRANCE

[3] UNIV PIERRE & MARIE CURIE,CHIM PHYS LAB 176,F-75231 PARIS 05,FRANCE

来源：

关键词：

D O I：

10.1080/00018738600101891

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：237 / 274

页数：38

共 53 条

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