ON THE KINETICS OF THE CVD OF SI FROM SIH2CL2/H2 AND SIC FROM CH3SICL3/H2 IN A VERTICAL TUBULAR HOT-WALL REACTOR

被引：26

作者：

LANGLAIS, F

PREBENDE, C

TARRIDE, B

NASLAIN, R

机构：

来源：

JOURNAL DE PHYSIQUE | 1989年 / 50卷 / C-5期

关键词：

D O I：

10.1051/jphyscol:1989515

中图分类号：

学科分类号：

摘要：

引用

页码：93 / 103

页数：11

共 22 条

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