METAL-SEMICONDUCTOR INTERFACIAL REACTIONS - NI-SI SYSTEM

被引：84

作者：

CHEUNG, NW

GRUNTHANER, FJ

GRUNTHANER, PJ

MAYER, JW

ULLRICH, BM

机构：

[1] CALTECH,JET PROP LAB,PASADENA,CA 91103

[2] CORNELL UNIV,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 03期

关键词：

D O I：

10.1116/1.570994

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：917 / 923

页数：7

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