SEEDED AND LIMITED SEEDING REGROWTH OF SI OVER SIO2 BY CW LASER ANNEALING

被引:18
作者
MAGEE, TJ [1 ]
PALKUTI, LJ [1 ]
ORMOND, R [1 ]
LEUNG, C [1 ]
GRAHAM, S [1 ]
机构
[1] AMDAHL CORP,SUNNYVALE,CA 94086
关键词
D O I
10.1063/1.92332
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:248 / 250
页数:3
相关论文
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