DEPTH PROFILE OF THE MICROHARDNESS IN HELIUM IMPLANTED GAP

被引：10

作者：

ASCHERON, C

NEUMANN, H

机构：

来源：

CRYSTAL RESEARCH AND TECHNOLOGY | 1987年 / 22卷 / 12期

关键词：

D O I：

10.1002/crat.2170221211

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

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页码：1493 / 1496

页数：4

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