LOW-PRESSURE GAS-DISCHARGE MODELING

被引：80

作者：

LISTER, GG

机构：

[1] Thorn EMI Central Research Laboratory, Hayes, Middlesex, UB3 1HH, Dawley Road

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1992年 / 25卷 / 12期

关键词：

D O I：

10.1088/0022-3727/25/12/001

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Low-pressure gas discharge modelling is reviewed, both from a historical perspective and for current industrial applications. An overview of the basic mathematical and physical models used to describe low-pressure discharges is given, together with a summary of the most common numerical techniques which have been adopted. Modelling of the DC gloW discharge and discharges maintained by high-frequency (RF and microwave) electromagnetic fields is reviewed, with illustrations of the validity of these models in predicting discharge properties and explaining and interpreting experimental results.

引用

页码：1649 / 1680

页数：32

共 325 条

[1] THE PLASMA-ETCHING OF POLYSILICON WITH CF3CL/ARGON DISCHARGES .1. PARAMETRIC MODELING AND IMPEDANCE ANALYSIS [J].