TOWARDS UNDERSTANDING THE GROWTH-MECHANISM OF III-V SEMICONDUCTORS ON AN ATOMIC SCALE

被引:14
作者
NISHINAGA, T
SUZUKI, T
机构
[1] Department of Electronic Engineering, Faculty of Engineering, University of Tokyo, Bunkyo-ku, Tokyo, 113, 7-3-1, Hongo
关键词
D O I
10.1016/0022-0248(93)90292-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The current understanding of mechanisms of epitaxial growth for III-V compound semiconductors is reviewed. To give a more complete understanding of the growth, the mechanisms for both vapor and solution growth are discussed, where MBE and LPE are taken respectively as their representatives. The transport of the growth species from the sources to the growth point, such as a kink of a growth step, is divided into several stages. The first is the transport in the bulk phase to the growth surface, and the second is the surface diffusion to the step. It is shown that in MBE surface diffusion is the rate limiting process for growth while bulk diffusion directly to the growth step plays a major role in solution growth. Nucleation, surface diffusion and the degree of equilibrium at the step edge in MBE and the interface supersaturation and the formation of macrostep in solution growth are discussed.
引用
收藏
页码:37 / 43
页数:7
相关论文
共 17 条
[1]   DISTRIBUTIONS OF GROWTH-RATES ON PATTERNED SURFACES MEASURED BY SCANNING MICROPROBE REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION [J].
HATA, M ;
ISU, T ;
WATANABE, A ;
KATAYAMA, Y .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (04) :692-696
[2]   THERMODYNAMIC ASPECTS OF MOLECULAR-BEAM EPITAXY - HIGH-TEMPERATURE GROWTH IN THE GAAS/GA1-XALXAS SYSTEM [J].
HECKINGBOTTOM, R .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (02) :572-575
[3]  
Ichikawa M., 1989, Material Science Reports, V4, P147, DOI 10.1016/S0920-2307(89)80004-0
[4]   TRANSFORMATIONS ON CLEAN SI(111) STEPPED SURFACE DURING SUBLIMATION [J].
LATYSHEV, AV ;
ASEEV, AL ;
KRASILNIKOV, AB ;
STENIN, SI .
SURFACE SCIENCE, 1989, 213 (01) :157-169
[5]   REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION OSCILLATIONS FROM VICINAL SURFACES - A NEW APPROACH TO SURFACE-DIFFUSION MEASUREMENTS [J].
NEAVE, JH ;
DOBSON, PJ ;
JOYCE, BA ;
ZHANG, J .
APPLIED PHYSICS LETTERS, 1985, 47 (02) :100-102
[6]   SHAPE OF ATOMIC STEPS AND INTERFACE SUPERSATURATION BETWEEN LPE MACROSTEPS [J].
NISHINAGA, T ;
TSUKAMOTO, K ;
KOMATSU, H ;
SASAOKA, C ;
MOCHIZUKI, K .
JOURNAL OF CRYSTAL GROWTH, 1986, 79 (1-3) :806-810
[7]   THEORETICAL-STUDY OF MODE TRANSITION BETWEEN 2D-NUCLEATION AND STEP FLOW IN MBE GROWTH OF GAAS [J].
NISHINAGA, T ;
CHO, KI .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1988, 27 (01) :L12-L14
[8]   GROWTH INDUCED COMPOSITIONAL NON-UNIFORMITY IN (GA,AL)AS AND THERMODYNAMICAL ANALYSIS [J].
NISHINAGA, T ;
MOCHIZUKI, K ;
YOSHINAGA, H ;
SASAOKA, C ;
WASHIYAMA, M .
JOURNAL OF CRYSTAL GROWTH, 1989, 98 (1-2) :98-107
[9]   STUDY OF NITROGEN INHOMOGENEITY IN LPE GAP BY SPATIALLY RESOLVED PHOTOLUMINESCENCE [J].
NISHINAGA, T ;
SASAOKA, C ;
PAK, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (05) :836-840
[10]   THE ROLE OF STEP KINETICS IN MBE OF COMPOUND SEMICONDUCTORS [J].
NISHINAGA, T ;
SUZUKI, T .
JOURNAL OF CRYSTAL GROWTH, 1991, 115 (1-4) :398-405