EFFECTS OF PHOTOELECTRONS EJECTED FROM THE SUBSTRATE ON PATTERNING CHARACTERISTICS IN X-RAY-LITHOGRAPHY

被引：7

作者：

DEGUCHI, K

NAMATSU, H

KOMATSU, K

YOSHIKAWA, A

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 02期

关键词：

D O I：

10.1116/1.583947

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：551 / 554

页数：4

共 7 条

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HOFF, PH
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[3] SPURIOUS EFFECTS CAUSED BY CONTINUOUS RADIATION AND EJECTED ELECTRONS IN X-RAY LITHOGRAPHY
MALDONADO, JR
COQUIN, GA
MAYDAN, D
SOMEKH, S
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1329 - 1331
[4] ETCHING CHARACTERISTICS OF POLYSILOXANE AND APPLICATION TO MULTILAYER RESIST PROCESSES
NAMATSU, H
YOSHIKAWA, A
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (10) : 2118 - 2123
[5] SUB-MICRON PATTERN REPLICATION USING A HIGH CONTRAST MASK AND 2-LAYER RESIST IN X-RAY-LITHOGRAPHY
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YOSHIHARA, H
WATANABE, I
NAKAYAMA, S
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (01): : 63 - 67
[6] TISCHER P, 1978, 8TH P INT C EL ION B, P444
[7] VEIGELE WJ, 1973, ATOM DATA, V5, P5