INFRARED STUDY OF (H,BE)-ACCEPTOR, (D,BE)-ACCEPTOR, AND (LI,BE)-ACCEPTOR COMPLEXES IN SILICON

被引:17
作者
PEALE, RE [1 ]
MURO, K [1 ]
SIEVERS, AJ [1 ]
机构
[1] CORNELL UNIV,CTR MAT SCI,ITHACA,NY 14853
来源
PHYSICAL REVIEW B | 1990年 / 41卷 / 09期
关键词
D O I
10.1103/PhysRevB.41.5881
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The temperature and stress dependences of the p1/2-series 2p line for the acceptors (Li,Be), (D,Be), and (H,Be) in silicon have been measured. The results demonstrate that (Li,Be) is a fixed 111-oriented defect with a ground state split by local distortion and that (D,Be) and (H,Be) undergo either tunneling or hindered rotor motion. A far-infrared study of the ground-state splitting of (Li,Be) also reveals an unexpected 4-cm-1 line that, based on temperature-dependent infrared spectra, we have attributed to the neutral double-acceptor Be. Our results for (Li,Be) provide a standard to which the unusual features in the temperature and stress dependences of (D,Be) and (H,Be) can be compared. For both (D,Be) and (H,Be) we find a blue-shifted replica of the 2p line and a ground-state manifold consisting of at least three well-resolved energy levels. This multiplet is explained by a tunneling model which we extend to give quantitative formulas for the stress dependence. Comparison of the model with our stress data provides additional evidence that (D,Be) and (H,Be) either tunnel or rotate between equivalent equilibrium orientations and that these orientations are along 111 directions, contrary to the results of recent numerical simulations. © 1990 The American Physical Society.
引用
收藏
页码:5881 / 5892
页数:12
相关论文
共 22 条
[1]  
AGGARWAL RL, 1967, PHYS REV, V138, P686
[2]   ABSORPTION OF OXYGEN IN SILICON IN NEAR AND FAR INFRARED [J].
BOSOMWORTH, DR ;
HAYES, W ;
SPRAY, ARL ;
WATKINS, GD .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1970, 317 (1528) :133-+
[3]   QUANTITATIVE PIEZOSPECTROSCOPY OF GROUND AND EXCITED-STATES OF ACCEPTORS IN SILICON [J].
CHANDRAS.HR ;
FISHER, P ;
RAMDAS, AK ;
RODRIGUE.S .
PHYSICAL REVIEW B, 1973, 8 (08) :3836-3851
[4]   STUDY OF BERYLLIUM-HYDROGEN COMPLEXES IN SILICON [J].
CROUCH, RK ;
ROBERTSON, JB ;
MORGAN, HT ;
GILMER, TE ;
FRANKS, RK .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1974, 35 (07) :833-837
[5]   STUDY OF BERYLLIUM AND BERYLLIUM-LITHIUM COMPLEXES IN SINGLE-CRYSTAL SILICON [J].
CROUCH, RK ;
ROBERTSO.JB ;
GILMER, TE .
PHYSICAL REVIEW B, 1972, 5 (08) :3111-&
[6]   STRUCTURE AND PROPERTIES OF HYDROGEN-IMPURITY PAIRS IN ELEMENTAL SEMICONDUCTORS [J].
DENTENEER, PJH ;
VAN DE WALLE, CG ;
PANTELIDES, ST .
PHYSICAL REVIEW LETTERS, 1989, 62 (16) :1884-1887
[7]   ELECTRONIC EFFECTS IN ELASTIC CONSTANTS OF N-TYPE SILICON [J].
HALL, JJ .
PHYSICAL REVIEW, 1967, 161 (03) :756-&
[8]   LITHIUM-OXYGEN DONOR IN GERMANIUM - DYNAMIC TUNNELING SYSTEM [J].
HALLER, EE ;
FALICOV, LM .
PHYSICAL REVIEW LETTERS, 1978, 41 (17) :1192-1194
[9]   ACCEPTOR COMPLEXES IN GERMANIUM - SYSTEMS WITH TUNNELING HYDROGEN [J].
HALLER, EE ;
JOOS, B ;
FALICOV, LM .
PHYSICAL REVIEW B, 1980, 21 (10) :4729-4739
[10]   STATIC NONTUNNELING MODELS FOR THE SHALLOW DONORS D(H,O) AND D(LI,O) IN GERMANIUM [J].
HAM, FS .
PHYSICAL REVIEW B, 1988, 38 (08) :5474-5489