GETTER SPUTTERING - REVIEW

[21] Metallic media and surfaces [J]. KOLLOID-ZEITSCHRIFT, 1932, 61 (02): : 208 - 218

[22] CHARACTERISTICS OF RF SPUTTERED BARIUM-TITANATE FILMS ON SILICON [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01): : 91 - &

[23] BIAS SPUTTERING - ITS TECHNIQUES AND APPLICATIONS [J]. VACUUM, 1967, 17 (03) : 129 - &

[24] STRONG J, 1938, MODERN PHYSICAL LABO

[25] GETTER SPUTTERING FOR PREPARATION OF THIN FILMS OF SUPERCONDUCTING ELEMENTS + COMPOUNDS [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (3P1) : 554 - &

[26] THEUERER HC, 1965, T METALL SOC AIME, V233, P588

[27] YARWOOD J, 1945, HIGH VACUUM TECHNIQU

[28] 1972, ELECTRONIC COMPONENT, V13, P743

[29] 1970, PHYSICS EXHIBITION H

[21] Metallic media and surfaces [J]. KOLLOID-ZEITSCHRIFT, 1932, 61 (02): : 208 - 218

[22] CHARACTERISTICS OF RF SPUTTERED BARIUM-TITANATE FILMS ON SILICON [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01): : 91 - &

[23] BIAS SPUTTERING - ITS TECHNIQUES AND APPLICATIONS [J]. VACUUM, 1967, 17 (03) : 129 - &

[24] STRONG J, 1938, MODERN PHYSICAL LABO

[25] GETTER SPUTTERING FOR PREPARATION OF THIN FILMS OF SUPERCONDUCTING ELEMENTS + COMPOUNDS [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (3P1) : 554 - &

[26] THEUERER HC, 1965, T METALL SOC AIME, V233, P588

[27] YARWOOD J, 1945, HIGH VACUUM TECHNIQU

[28] 1972, ELECTRONIC COMPONENT, V13, P743

[29] 1970, PHYSICS EXHIBITION H