FABRICATION OF BURIED LAYERS OF SIO2 AND SI3N4 USING ION-BEAM SYNTHESIS

被引:97
作者
REESON, KJ
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D O I
10.1016/S0168-583X(87)80056-3
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
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页码:269 / 278
页数:10
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