DEEP ULTRAVIOLET ALSER ETCHING OF VIAS IN POLYIMIDE FILMS

[1] BLACK JG, 1987, MATER RES SOC S P, V75, P651

[2] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043

[3] BRUCK SD, 1969, POLYM SCI, V6, P49

[4] BURGGRAAF P, 1988, SEMICOND INT, V6, P117

[5] BURGGRAAF S, 1988, SEMICOND INT, V4, P58

[6] CALORIMETRIC AND ACOUSTIC STUDY OF ULTRAVIOLET-LASER ABLATION OF POLYMERS [J]. APPLIED PHYSICS LETTERS, 1985, 46 (09) : 828 - 830

[7] EMISSION-SPECTRA AND ETCHING OF POLYMERS AND GRAPHITE IRRADIATED BY EXCIMER LASERS [J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (07) : 2120 - 2126

[8] TEMPERATURE RISE INDUCED BY A LASER-BEAM .2. NON-LINEAR CASE [J]. APPLIED PHYSICS LETTERS, 1978, 33 (08) : 786 - 788

[9] TEMPERATURE RISE INDUCED BY A LASER-BEAM [J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (09) : 3919 - 3924

[10] CONTROLLED MODIFICATION OF ORGANIC POLYMER SURFACES BY CONTINUOUS WAVE FAR-ULTRAVIOLET (185NM) AND PULSED-LASER (193NM) RADIATION - XPS STUDIES [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1984, 106 (15) : 4288 - 4290

[1] BLACK JG, 1987, MATER RES SOC S P, V75, P651

[2] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043

[3] BRUCK SD, 1969, POLYM SCI, V6, P49

[4] BURGGRAAF P, 1988, SEMICOND INT, V6, P117

[5] BURGGRAAF S, 1988, SEMICOND INT, V4, P58

[6] CALORIMETRIC AND ACOUSTIC STUDY OF ULTRAVIOLET-LASER ABLATION OF POLYMERS [J]. APPLIED PHYSICS LETTERS, 1985, 46 (09) : 828 - 830

[7] EMISSION-SPECTRA AND ETCHING OF POLYMERS AND GRAPHITE IRRADIATED BY EXCIMER LASERS [J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (07) : 2120 - 2126

[8] TEMPERATURE RISE INDUCED BY A LASER-BEAM .2. NON-LINEAR CASE [J]. APPLIED PHYSICS LETTERS, 1978, 33 (08) : 786 - 788

[9] TEMPERATURE RISE INDUCED BY A LASER-BEAM [J]. JOURNAL OF APPLIED PHYSICS, 1977, 48 (09) : 3919 - 3924

[10] CONTROLLED MODIFICATION OF ORGANIC POLYMER SURFACES BY CONTINUOUS WAVE FAR-ULTRAVIOLET (185NM) AND PULSED-LASER (193NM) RADIATION - XPS STUDIES [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1984, 106 (15) : 4288 - 4290