MICROSTRUCTURE MODIFICATION OF TIN BY ION-BOMBARDMENT DURING REACTIVE SPUTTER DEPOSITION

被引：304

作者：

PETROV, I

HULTMAN, L

HELMERSSON, U

SUNDGREN, JE

GREENE, JE

机构：

[1] LINKOPING UNIV,DEPT PHYS,THIN FILM GRP,S-58183 LINKOPING,SWEDEN

[2] UNIV ILLINOIS,DEPT MAT SCI,COORDINATED SCI LAB,URBANA,IL 61801

[3] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801

来源：

THIN SOLID FILMS | 1989年 / 169卷 / 02期

关键词：

D O I：

10.1016/0040-6090(89)90713-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：299 / 314

页数：16

共 39 条

[1] A CORRELATION OF AUGER-ELECTRON SPECTROSCOPY, X-RAY PHOTOELECTRON-SPECTROSCOPY, AND RUTHERFORD BACKSCATTERING SPECTROMETRY MEASUREMENTS ON SPUTTER-DEPOSITED TITANIUM NITRIDE THIN-FILMS
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[2] Chapman B., 1980, GLOW DISCHARGE PROCE
[3] Chu W. K., 1978, BACKSCATTERING SPECT
[4] CLEMENTS RM, 1978, J VAC SCI TECHNOL, V15, P193, DOI 10.1116/1.569453
[5] GORANCHEV B, 1976, THIN SOLID FILMS, V35, P173
[6] EPITAXIAL CRYSTAL-GROWTH BY SPUTTER DEPOSITION - APPLICATIONS TO SEMICONDUCTORS .1.
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[7] THE ROLE OF ION SURFACE INTERACTIONS AND PHOTOINDUCED REACTIONS DURING FILM GROWTH FROM THE VAPOR-PHASE
GREENE, JE
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LUBBEN, D
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[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 27 (01) : 226 - 242
[8] THE DEVELOPMENT OF GRAIN-STRUCTURE DURING GROWTH OF METALLIC-FILMS
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SMITH, DA
[J]. ACTA METALLURGICA, 1984, 32 (05): : 773 - 781
[9] MICROSTRUCTURE AND PHYSICAL-PROPERTIES OF POLYCRYSTALLINE METASTABLE TI0.5AL0.5N ALLOYS GROWN BY DC MAGNETRON SPUTTER DEPOSITION
HAKANSSON, G
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MCINTYRE, D
GREENE, JE
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[J]. THIN SOLID FILMS, 1987, 153 : 55 - 65
[10] MICROSTRUCTURE EVOLUTION IN TIN FILMS REACTIVELY SPUTTER DEPOSITED ON MULTIPHASE SUBSTRATES
HELMERSSON, U
SUNDGREN, JE
GREENE, JE
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 500 - 503

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