OXYGEN DIFFUSION IN SILICON AND THE INFLUENCE OF DIFFERENT DOPANTS

被引：45

作者：

GASS, J ^{[1
]}

MULLER, HH ^{[1
]}

STUSSI, H ^{[1
]}

SCHWEITZER, S ^{[1
]}

机构：

[1] BROWN BOVERI CO LTD,BIRR,SWITZERLAND

来源：

JOURNAL OF APPLIED PHYSICS | 1980年 / 51卷 / 04期

关键词：

D O I：

10.1063/1.327922

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2030 / 2037

页数：8

共 22 条

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