SIMULATION OF ELECTRON-BEAM EXPOSURE OF SUB-MICRON PATTERNS

被引：10

作者：

MCMILLAN, JA ^{[1
]}

JOHNSON, S ^{[1
]}

MACDONALD, NC ^{[1
]}

机构：

[1] CORNELL UNIV,NATL NANOFABRICAT FACIL,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584529

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1540 / 1545

页数：6

共 21 条

[1] HIGH-RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN-FILMS [J].

ADESIDA, I ;

EVERHART, TE ;

SHIMIZU, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1743-1748

[2] PROXIMITY EFFECT DEPENDENCE ON SUBSTRATE MATERIAL [J].

AIZAKI, N .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1726-1733

[3] PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY [J].

CHANG, THP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1271-1275

[4] SIMPLE THEORY CONCERNING THE REFLECTION OF ELECTRONS FROM SOLIDS [J].

EVERHART, TE .

JOURNAL OF APPLIED PHYSICS, 1960, 31 (08) :1483-1490

[5] ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING - EXPERIMENT [J].

HAWRYLUK, RJ ;

SMITH, HI ;

SOARES, A ;

HAWRYLUK, AM .

JOURNAL OF APPLIED PHYSICS, 1975, 46 (06) :2528-2537

[6]

HEINRICH KFJ, 1976, NBS SPECIAL PUBL, V460

[7] A PROGRAM FOR MONTE-CARLO SIMULATION OF ELECTRON-ENERGY LOSS IN NANOSTRUCTURES [J].

JOHNSON, S ;

MACDONALD, NC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06) :1513-1518

[8]

Kyser D. F., 1984, Electron Beam Interactions with Solids for Microscopy, Microanalysis and Microlithography. Proceedings of the 1st Pfefferkorn Conference, P331

[9] SPATIAL-RESOLUTION LIMITS IN ELECTRON-BEAM NANOLITHOGRAPHY [J].

KYSER, DF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1391-1397

[10]

KYSER DF, 1974, 6TH P INT C EL ION B, P205

← 1 2 3 →