INFLUENCE OF PROTON IMPLANTATION ON THE PROPERTIES OF CUINSE2 SINGLE-CRYSTALS (I) - ION CHANNELING STUDY OF LATTICE DAMAGE

被引:19
作者
YAKUSHEV, MV
TOMLINSON, RD
NEUMANN, H
机构
[1] Department of Electronic and Electrical Engineering, University of Salford, Salford
[2] Leipzig, D-04347
关键词
D O I
10.1002/crat.2170290127
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The lattice damage of p-type CuInSe2 single crystals implanted with 10 keV protons in the fluence range from 2.5.10(14) to 8.10(15) cm(-2) was investigated using the Rutherford backscattering/channeling technique. At proton fluences up to about 2.10(15) Cm-2 radiation annealing of the defects is observed which is ascribed to very high defect concentrations in the unimplanted samples. At higher fluences radiation damage occurs but the concentration of radiation induced defects ramains low. There are indications that selenium interstitials or defect complexes with selenium interstitials involved are stable defects at room temperature.
引用
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页码:125 / 132
页数:8
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