ISOTOPIC EFFECTS IN AC - (H/D) FILMS DEPOSITED FROM METHANE/HYDROGEN RF PLASMAS

被引：7

作者：

BOUTARD, D

MOLLER, W

机构：

[1] Max-Planck-Institut fiir Plasmaphysik, EURATOM Association, Federal Republic of Germany

来源：

JOURNAL OF MATERIALS RESEARCH | 1990年 / 5卷 / 11期

关键词：

D O I：

10.1557/JMR.1990.2451

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Hard amorphous hydrocarbon films have been deposited by RF glow discharges in methane/hydrogen mixtures with different hydrogen isotopes. For CH4 + D2 and CD4 + H2 gas mixtures, the film growth rate, the density, the refractive index, and the isotopic hydrogen content are obtained as functions of the process gas composition. Further, the hydrogen loss induced by 15 keV helium ions is studied. The results are qualitatively interpreted in terms of different effects of ion bombardment during film deposition which influence the properties of the resulting films. © 1990, Materials Research Society. All rights reserved.

引用

页码：2451 / 2455

页数：5